Tetramethylammonium Hydroxide TMAH CAS 75-59-2

BLIT Chemical Tetramethylammonium Hydroxide (TMAH) is a quaternary ammonium compound widely used in industries such as electronics, chemicals, and photolithography. TMAH is primarily known for its role as a strong base and etching agent, especially in semiconductor manufacturing for photoresist development and silicon wafer processing. Its high reactivity makes it ideal for various organic synthesis and etching applications.

Specification:

Application:

Semiconductor Industry: Used extensively for photoresist stripping and silicon wafer etching in photolithography processes.

Organic Synthesis: TMAH serves as a strong base and catalyst in various organic reactions, promoting the formation of specific reaction products.

Chemical Processing: Functions as an effective surfactant and catalyst in several industrial applications, including solvent extraction.

Electronics Manufacturing: Plays a critical role in the production of microchips and other electronic components by assisting in precision etching.

Usage Guidelines:

Environmental Hazard: TMAH is hazardous to aquatic life, so disposal must be conducted in accordance with local environmental regulations.

Handling: Always wear PPE, including gloves, goggles, and protective clothing. Ensure that the handling environment is well-ventilated.

Storage: Store in a tightly sealed container in a cool, dry location away from direct sunlight and incompatible materials like acids.

Dilution: When diluting, always add TMAH to water, not the other way around, to prevent exothermic reactions and splashing.

Package:

25kg/drum 9.0mt/20’FCL